Mike Meyer, Advanced Energy Industries, Fort Collins, CO
The RF-based plasma PECVD systems that are deployed in applications ranging from solar panels and flat panel displays to precision optics and automotive glass demand accurate, reliable and repeatable power delivery to optimize yield and productivity. As manufacturing technologies evolve and rapid plasma transitions become the norm there is a growing demand for technologies that combine precise RF control with dynamic response to plasma changes.
As a result, RF power supplies are evolving in areas such as frequency accuracy, real-time power and impedance management, arc management, phase synchronization and output coverage. Furthermore, with a focus on maintaining high levels of productivity, manufacturers are looking for systems that can give them more insight into the process itself.
This presentation identifies the requirements of the latest PECVD processes and introduces new digitally controlled RF power delivery systems that address these requirements. It will look at key system functions and explain how the technologies provide flexibility that supports process optimization across a variety of applications. The presentation will also outline how combining power hardware with platforms that access and analyze power system delivery data leads to actionable intelligence that improves yields and productivity by allowing processes to be refined and by identifying signs of problems before they incur costly downtime.