Wednesday, May 5, 2021
11:30 AM - 11:50 AM (EDT)
Sputtering Targets by Powder Metallurgy for Display, Energy and Hardcoating Applications
Christian Linke - Plansee SE

Christoph Adelhelm1, *Christian Linke1, Harald Köstenbauer1, Enrico Franzke1, Jörg Winkler1, Sebastian Seibold2, Wilfried Walgram2, Marcus Wolff2, Peter Polcik2
1Plansee SE, Reutte, Austria; 2Plansee Composite Materials, Lechbruck am See, Germany
Plansee continuously develops new thin film coating materials for applications in the display, solar, microelectronics and hardcoating industry. Molybdenum is used in thin-film transistors (TFT) for displays due to its superior adhesion on glass and good conductivity. For future high-end applications, lower resistance metal lines are required in the TFT. By adding W-based seed-layers, the conductivity of Mo can be improved by up to 30%. MoOx ceramic targets have been introduced into the manufacturing process of high-end flat panel displays. Dark MoOx films are deposited to cover reflecting areas and provide superior contrast. By varying the oxygen content and metal-doping in the target, the optical properties can be tuned. Other applications can be addressed by adding O2 during film deposition: wide bandgap, transparent MoOx films show interesting electronic properties. MoOx films are introduced together with TiOx as ITO replacement for perovskite solar cells. For TiC films it is beneficial to deposit from a TiC ceramic target in an argon atmosphere instead of creating the coating with a Ti target in hydrocarbon atmosphere. The gaseous carbon contaminates the coating chamber and time-consuming cleaning is necessary. Secondly, sputtering from ceramic targets leads to a better process stability, as the coating composition is pre-defined by the target composition.

Session Type
Vendor Innovator Showcase