*Pavel Shapotkin, Izovac Ltd., Minsk, Belarus
The technology and scalable equipment are represented as a complete solution for ion etching of large-scale substrates in the mass production of electronic, automotive, architectural and defense industries. The aspects of removing such defects as conveyor imprints (suction cups, rollers, etc.), oxide films, residues of adsorbed water and gases are considered. The principle of designing a ready-made solution for any applications is shown.