This course will be a detailed study of electron beam evaporation with the end purpose of making quality thin films using this technique. To do this, we must explore the inner workings of a modern electron beam (e-beam) gun, the thermal, magnetic, and electrical circuits in the e-beam gun, as well as the control systems. Basic hardware and process troubleshooting will also be covered. This course is designed to interest beginning and advanced users of this technology.

Target Audience: Engineers, technicians, and researchers in vacuum coating, semiconductor, optics, or nanotechnology industries (appropriate for beginners and intermediate users)

Prerequisites: Basic understanding of vacuum technology and physical vapor deposition (PVD) is suggested but not required.

Course Objectives:

• A working knowledge of how an e-gun works and how it is controlled.
• Key components and design considerations for e-beam evaporation.
• Select appropriate materials and deposition parameters for specific applications.
• Parameters to change to optimize thin film quality.
• Understand quartz crystal monitors and their use in electron beam evaporation.
• How to sculpt a process to ensure it runs well and makes the desired film.
• Basic trouble shooting of e-gun and process.
• Advantages and disadvantages of electron beam evaporation.