This course is designed for students, technicians, and engineers interested in the operation or design of ion beam equipment. It covers the fundamentals of ion source physics, including essential concepts in vacuum and plasma physics. The course provides a detailed description of the principal components of ion sources used for gas ionization, ion acceleration, and beam neutralization.

Participants will gain an overview of various commercially available broad beam ion sources, including single grid, multi-grid, and gridless ion sources. The advantages and limitations of different types of ion sources and neutralizers will be discussed. Additionally, the course covers diagnostic instruments used for ion beam characterization.

Practical aspects of system integration and the operation of these sources are also addressed, including the interactions between the ion source beam, plasma, and other parts of the vacuum system.

Target Audience: Engineers, technicians, and researchers in vacuum coating, semiconductor, optics, or nanotechnology industries (appropriate for beginners and intermediate users)

Prerequisites: Basic understanding of vacuum technology and physics is suggested but not required.