Spectroscopic ellipsometry (SE) is a powerful optical measurement technique for the characterization of thin films and surfaces. The non-invasive nature of SE allows for integration of in situ SE with vacuum/process chambers. In situ SE has been applied to most vacuum processes, including ALD, ALE, PLD, evaporation, sputtering, MBE, MOCVD, and more. The advantage of collecting data “in situ” is that the surface and layers can be monitored or even controlled in real time. This technique allows quick determination of film thickness, growth and etch rates, optical constants, composition, surface and interface quality, film nucleation behavior, and other related material properties. It also allows a process to be quickly characterized by measuring how these thin film properties vary with process conditions. This tutorial provides an overview of the ellipsometry technique, discusses typical in situ SE hardware integration with vacuum chambers, in situ measurements, and data analysis examples.

Topical Outline:

• Spectroscopic Ellipsometry Introduction
• In Situ Spectroscopic Ellipsometry Hardware Integration
• Common Chamber Integration
• Considerations and Calibration
• In Situ Data Acquisition Modes
• Remote Communication with Ellipsometer Software for Control and Feedback
• Dynamic Data Analysis Examples
  • Growth and etch rates
  • Film nucleation and surface/interface quality
  • Optical constants versus process conditions

Target Audience: Engineers, technicians, and researchers in vacuum coating, semiconductor, optics, or nanotechnology industries (appropriate for beginners and intermediate users).

Prerequisites: Basic understanding of thin films deposition techniques is suggested but not required.