Tim Dubbs, Advanced Energy Industries, Milpitas, CA
Accurate temperature measurements are critical in thin film deposition processes as temperature can directly influence film uniformity, yield and final product performance. Traditional pyrometry techniques often assume constant emissivity, leading to significant errors due to dynamic changes in surface properties during deposition. In-situ emissivity measurements offer a robust solution by enabling real-time monitoring and correction of emissivity variations, thereby enhancing temperature accuracy. This approach involves simultaneously measuring the emitted infrared radiation and an additional reflection signal used to determine the changing emissivity. This presentation explores the principles, instrumentation, and integration strategies for in-situ emissivity measurement, highlighting its impact on advanced Atomic Layer Deposition (ALD), Physical Vapor Deposition (PVD) and Metal-Organic Chemical Vapor Deposition (MOCVD) and offering insights into future developments for real-time process control. In addition, we describe emissivity independent ratio pyrometers which also may be used for these applications.