Krzysztof Ruda¹, W.Gajewski¹, A.Martynow¹, D.Workowski¹, Y.Shen^2
1TRUMPF Huettinger Sp. z o.o., Zielonka, Poland
²TRUMPF GmbH + Co. KG Hüttinger, Freiburg im Breisgau, Germany
We introduce the TruPlasma DC 4040/4060 G2 Dual Output, a dual channel pulsed DC generator for reactive sputtering and critical PVD/PECVD where stability and throughput are essential. Each independent output delivers 20 or 30 kW, with 800 V variants for higher field coatings. A fast digital control architecture enables pulse rates up to 50 kHz with adjustable reverse voltage to 100 V, while an advanced arc suite and Pulse Voltage Limiting suppress spikes and ripple for robust, low defect operation. Users can tailor behavior via Joule Mode, Long Ramp, Process Timer, Target Life, and internal/external synchronization; standard RS 232/USB/EtherCAT/Profinet streamline integration.
For transparent conductive oxides such as AZO in photovoltaic stacks, TruPlasma helps stabilize the metallic/poisoned transition, mitigate target charging, and reduce micro arcing. Dual synchronized outputs support co sputter or twin cathode operation for uniform large area films, while constant energy delivery maintains AZO stoichiometry, microstructure, and stress across long runs. The result is denser, more homogeneous layers with lower sheet resistance at a given transmission and tighter within substrate uniformity. Beyond control capability, two outputs are consolidated in one compact 8U, 19" chassis; in 2×30 kW setups this can reduce footprint by up to 50% and cut CAPEX by >10% in multi source lines. Public configurations include 2×20 kW and 2×30 kW, plus 800 V variants. Representative applications: HIT and perovskite PV (AZO), FCCL and TGV, and industrial PVD/PECVD. Demo units are available for qualification; sales release is planned for Q1 2026.