Lara Maroto-Diaz, Jessica Stoner, Tony Hart, Robert Brown, Joseph Brindley, Patrick McCarthy, Dermot Monaghan, Gencoa Ltd, Liverpool, United Kingdom
A relative movement of a plasma over a target surface offers many benefits. This is illustrated in the case of a rotating tube target form which combines a static plasma with dynamic movement of the target. Such rotatable target geometries are widely used in sputtering and arc PVD, and result in higher material utilisation and longer target lifetime.
Rotating-tube PVD sources are well suited for in-line flat-panel coating production systems, where longer uptime and improved target cleanliness help reduce overall unit costs. However, not all processes and machine geometries are compatible with this technology. The other alternative to create such an effect, is to move the plasma over the static target surface. This is achieved via mechanical or electromagnetic adjustment of the magnetic field used to confine the plasma.
Moving magnet technology in sputtering cathodes enables more uniform erosion of the target surface, significantly increasing target utilization while reducing defect formation during thin-film deposition. By dynamically redistributing the magnetic field, moving magnets minimize localized hot spots and suppress particle generation and arcing that are common with static magnet configurations. This technology is particularly valuable for sputtering costly target materials used in semiconductor applications, where maximizing material utilization and minimizing defects have a direct impact on manufacturing cost and yield. The result is longer target lifetime, improved process stability, and higher film quality, making moving magnets well suited for advanced semiconductor manufacturing where material efficiency and defect control are critical.
For industrial applications, moving magnets also offer a compelling alternative to rotatable cathodes, which are traditionally used to achieve high target utilization. Applying moving magnet technology to rectangular cathodes increases target use while preserving the key advantages of rectangular designs, including directional deposition, lower target manufacturing cost, and high deposition rate efficiency.
This talk will present the latest innovations developed by Gencoa in moving magnet technology for PVD applications, covering solutions from circular sources to long rectangular cathodes.