David Stevenson, Gennady Fiksel, Ampres, Inc., Ypsilanti, MI
Ampres has developed a truly disruptive range of linear ion beam sources. These sources enable 3 – 5X increase in the reactive sputtering rate. The also enable ion beam assisted deposition, ion beam sputtering and very high rate PECVD for a wide range of inorganic and organic coatings.
These ion sources are scalable to any length. They can be powered by DC, pulsed DC, AC, bipolar, 2, 4, and 13.56MHz.
In many applications they can enable a >50% decrease reduction in energy cost.