Shaun Pewsey, Brooks Instrument, Hatfield, PA
Atomic scale semiconductor device architectures are driving greater demands with multi-step process recipes requiring ultra-fast, highly repeatable, and accurate gas chemistry control. The Brooks Instrument pressure-based mass flow controller architecture combines a patented absolute/differential pressure sensor assembly and electronics providing 2ms flow measurement updates and a fast-acting downstream precision control valve with 100X reduction in leak-by when closed. This innovative design addresses slow response to descending flow setpoints and flow shut-off time typical of traditional pressure-based mass flow controllers.
We’ll explore the underlying design approach for pressure-based flow measurement and highlight how this mass flow controller architecture improves critical flow response time for Atomic Layer Deposition and Bosch/TSV Etch processes to deliver real-world benefits.
Additionally, attendees will gain insight into new and expanding features that support process fingerprinting, health monitoring and fault detection and predictive maintenance for Industry 4.0 and leading-edge Semiconductor device manufacturing.