Constant Rieille, Clément Linder, Sylvain LeCoultre, Berner Fachhochschule, Burgdorf, Switzerland
Particle contamination remains a major yield-limiting factor in thin-film deposition processes such as PVD (thermal evaporation, e-beam, magnetron sputtering, arc-deposition) and ALD. It leads to scattering sites and coating defects in optics and laser mirrors, fatal defects in semiconductor wafers, and surface or dimensional defects in micro- and nanomanufactured components.
Commercial in-situ particle monitors have so far failed to gain broad industrial acceptance due to high maintenance needs, poor correlation with real substrate contamination, and lack of robustness under harsh process conditions involving ultra-high vacuum, high temperatures, plasma exposure, and electromagnetic radiation. As a result, there is nowadays no commercially viable solution on the market.
We present a novel particle sensing approach developed at BFH and being commercialized through the spin-off Ogurion. The system is based on a compact, remote detection head optically linked to external electronics, enabling passive and robust operation even in the most demanding environments. The technology has been tested and validated in industrial PVD coaters with Swiss optical coating companies, as well as in laboratory and pilot-scale PVD e-beam systems.
Beyond continuous contamination detection during production campaigns, the system aims at providing valuable data for predictive maintenance, allowing reduction of scrap, and increased equipment uptime, translating into average yield gains. With a roadmap towards commercialization in 2026, this solution represents a breakthrough in contamination monitoring for thin-film deposition, with strong potential impact on manufacturing efficiency for equipment manufacturers and job coaters of different market segments.