Thomas Schütte, Jan-Peter Urbach, Peter Neiß, PLASUS GmbH, Mering, Germany
PLASUS is introducing its latest development for production control. The EMICON LC system - a layer control module for in-situ thin film measurements in real-time. Based on broadband photometric measurement technique the EMICON LC system provides real-time properties of the produced layer such as film thickness or color values.
While spectroscopic plasma process monitoring and control is a standard measurement technique of the EMICON systems for acquiring data from the current coating process the EMICON LC system provides additional information of the produced layer such as film thickness or color values.
The EMICON LC system is available as stand-alone system but also as add-on module for the plasma monitor systems EMICON SA and MC. Acquired data from both modules can be combined in real-time for more reliable production control.
Examples of selected industrial applications are presented demonstrating the powerful and reliable process control features of the EMICON systems for state of the art plasma processes.