This half day tutorial is intended for decision makers, engineers, technician and students interested in equipment availability, applications and process requirements of HIPIMS. Basic understanding or experience with plasma and materials is desirable but not required.

HIPIMS is a highly ionized pulsed sputtering process that produces significant ionization of the sputtered materials that, in turn, enables effective surface modification by ion etching and energetic deposition. Energetic deposition allows the formation of coatings with unique or superior properties compared to other deposition processes. Presently HIPIMS is undergoing the transition from academic research to being a major industrial process.

The tutorial starts with a short introduction in the basics of HIPIMS technology. An extended treatment of HIPIMS is provided by the tutorial C-323 “High Power Impulse Magnetron Sputtering. The main focus of this tutorial is on commercially available equipment and its specifications as well as the general processing principles. Finally industrial (or close to industrial) applications will be presented.