David Stevenson, Ampres, Inc., Ypsilanti, MI
The demand for more complex multilayer thin film coatings has created a need for improved PVD and PECVD plasma processes. Ampres has developed a new generation of scalable closed drift gas ionizers. These sources provide an economical tool for the deposition of complex high quality multilayer thin film coatings. The gas ionizers provide very high ionization rates in a compact fully scalable design. They are used to supply ionized reactive gas for enhanced magnetron sputtering processes and for a unique hybrid PVD–PECVD process.
These sources are ideally suited to deliver ionized reactive gases like Oxygen, Nitrogen and Fluorine direct to the substrate surface to form metal oxide, metal nitride and other complex thin film coatings. They also can be used as standalone plasma sources for PECVD and plasma etching applications.