Name
Development of Antibacterial Metal Oxide Thin Films for Neurostimulation Applications using Atomic Layer Deposition
Date
Monday, May 6, 2024
Time
2:50 PM - 3:10 PM
Description

Henna Khosla1, Wesley Seche2, Daniel Ammerman3, Sahar Elyahoodayan4, Gregory A. Caputo3, Jeffrey Hettinger3, Shahram Amini2,5, Gang Feng1
1Villanova University, Villanova, PA
2Pulse Technologies Inc., Quakertown, PA
3Rowan University, Glassboro, NJ
4University of Southern California, Los Angeles, CA
5University of Connecticut, Storrs, CT
Metal oxide thin films with antibacterial properties can be deposited via atomic layer deposition (ALD) on the surface of neurostimulation and cardiac rhythm management electrodes to prevent risks of post implantation infections and bacteria colonization. In this work, we report on the development of antibacterial platinum-iridium electrodes using a two-step process. Electrodes are first hierarchically restructured using femtosecond-laser hierarchical surface restructuring technology and then ALD is used to deposit ultrathin metal oxides of ZnO on hierarchically restructured electrodes. Structural, chemical, and mechanical properties of ZnO films were studied using X-ray diffraction, X-ray photoelectron spectroscopy, energy dispersive X-ray spectroscopy, scanning electron microscopy and nanoindentation. The antibacterial properties of the ALD-coated electrodes were also studied, particularly, the killing effect on the two common types of bacteria (E. coli and S. aureus) responsible for implantation infections.

Speakers
Henna Khosla - Villanova University