Hagen Bryja¹, Iqtidar Wasif^1,2, Matthias Preidl³, Adnan Muhammad¹, Sophie Simon¹, José Barzola Quiquia¹, Hannes Klumbies¹, Matthias Reinfried¹, Dietrich R.T. Zahn^2
1FHR Anlagenbau GmbH, Ottendorf-Okrilla, Germany
²Chemnitz University of Technology, Chemnitz, Germany
³Technical University Wien, Vienna, Austria
Aluminum-doped zinc oxide (Al:ZnO) and tantalum-doped titanium oxide (Ta:TiO₂) are promising transparent conductive oxides (TCO) for applications such as solar cells, light emitting diodes and electrochromic windows. Atomic layer deposition (ALD) offers an attractive method for the deposition of TCOs as it allows accurate tuning of the elemental composition by alternating binary ALD-processes in a supercycle approach.
Here, we investigate supercycle depositions of Al:ZnO and Ta:TiO₂ by thermal ALD in the FHR.Star.300.ALD system, focusing on the influence of different cycling ratios and film thicknesses on electrical and optical properties. In addition, we employ various characterization methods, such as transmission electron microscopy, energy-dispersive X-ray spectroscopy and atomic force microscopy to comprehensively assess the properties of the deposited films. Overall, the results highlight the versatility of ALD in the production of TCOs with customized properties.