Name
The R-ALD: An Economical ALD Research and Development System
Date
Wednesday, May 8, 2024
Time
11:30 AM - 11:50 AM
Description

Jacob A. Bertrand1, Frank Papa2
1Maxima Sciences LLC, Montgomery, OH
2GP Plasma, Medina, OH
Maxima Sciences LLC and GP Plasma would like to introduce the R-ALD (Research Atomic Layer Deposition) starter system. It is designed to ease entry into Atomic Layer Deposition (ALD) research. Historically, getting started in ALD research has required buying an expensive commercial system or custom one. Neither approach is suitable for most labs when getting started with a new deposition technology. Using the technical experience gleaned from over a decade of working on ALD applications and systems. Our RALD system is designed with the researcher in mind. It is sized to allow deposition on multiple 150 mm wafers, assemblies, or complex 3D substrates. In addition to the basic system we are developing add-ons to boost the system’s flexibility to support long term research. It is a reliable benchtop system which fits in a minimum footprint and does not require numerous or specialized utility support, allowing it to be dropped simply into an existing lab. The system’s user-friendly design allows the end user to easily manage maintenance, minimizing cost of ownership. By being capable of accepting standard pre-packaged, or refillable, precursor cylinders, the choices in chemistry are endless. Our goal is to provide a system that allows researchers to focus on their application. If you’re looking for a no-frills workhorse to jumpstart your ALD research, contact us.

Speakers
Jacob Bertrand - Maxima Sciences LLC