Moderator: Ton Hurkmans (IHI Ionbond Group)
Event Description: The requirements of Chemically Vapor Deposited (CVD) coatings for protective application has increased enormously over the past 50 years. The progress from simple monolayer coatings of the 1960s to the complex coating systems of today were made possible through increased development work, tailored to different applications needs. CVD technology has maintained an outstanding position for decades in the field of many applications. This success can be explained by the excellent mechanical properties and the thermochemical stability of the coatings. CVD is now a well-known technology in several industrial areas, like semiconductors, machining tools, components, coatings on fibre filaments, and powders.
Today’s development trends are towards the capability of coating complex geometries, hard and wear resistant coatings at high temperatures and also deposition of very dense coatings that provide diffusion protection barriers at harsh conditions (corrosive atmosphere, high temperature, …). Other developments are in several niche markets which ask for specifically designed coating material systems. In dedicated niche markets, CVD has the potential to fulfil very specific requirements as the coatings can be modified by either defined micro-structures, controlling the interface to different substrate materials and tailoring specific coating properties (for example electrical resistivity) by addition of doping elements. A good example is applying CVD technology in the optic and photovoltaic industries, where the coating properties are controlled to the required transparency or optical properties. It is applied on surfaces of multiple m2, including continued motion methods.
The coating processes are based on the chemical reactions on hot surfaces between reactant gases, which directly yield the solid coating materials. Besides rather simple shaped parts, it can be applied on complex shaped catalyst carriers, single fibres or powders (up to some μm and even nm). The performance of CVD coatings is strongly dependent on the match with the base materials of the to be coated products (diffusion phenomena, phase changes, residual stresses, etc.) A successful application of a CVD coating includes dedicated pre- and post-treatment concepts, modern etching, surface texturing methods, and in some cases special annealing steps.
During the colloquium, we will discuss how the CVD technology can address current market needs, present different concepts on how new developed solutions can be applied in industries with high capacity and quality requirements (multiple tools to be coated versus single semiconductor part or multiple kilometres of fibre filaments). Further topics are the impact of environmental regulations and new concepts of dealing with sensitive chemicals (the precursors). The expert panel represents academia, end users and equipment OEM’s. In that way, a broad overview of future CVD technology trends and solutions will be discussed, that will enable you to understand deeper your current processes or to find coating solutions that you may be looking for.

• Dev Banerjee (Kennametal)
• Christoph Czetti (Ceratizit)
• Jing-Jia Huang (Linköping University)
• Frank Mumme (Gemeinnützige KIMW Forschung GmbH)
• Hristo Strakov (Bernex)