Moderator: Herbert Gabriel (PVT Plasma und Vakuum Technik GmbH)
Event Description: High Power Impulse Magnetron Sputtering (HIPIMS) was discovered 25 years ago and has become a disruptive technology within the vacuum coating field. Although HIPIMS has become a mainstay in the semiconductor and in several other industries, there are still many misconceptions regarding its benefits and limitations. The purpose of this colloquium is to pragmatically separate fact from fiction. As a disruptive technology the promise is tempered by perception and expectation. Our panel will address the following areas to concretely bring to light the potential and reality of HIPIMS.

1) Deposition rate
2) Ion energy/selection and plasma density
3) Productivity
4) Scalability challenges
5) Applications

We will dedicate 25 minutes to each area led by a short presentation followed by a roundtable question and answer period. At the end of the session, we’ll ask for further questions and comments.

• Arutiun Ehiasarian (Sheffield Hallam University)
• Ralf Bandorf (Fraunhofer IST)
• Frank Papa (GP Plasma)
• Daniel Loch (Trumpf Hüttinger)
• Ivan Shchelkanov (Starfire Industries)