This course addresses scientists, engineers, technicians, and students that are interested in sputtering. This course will start with fundamentals on plasma discharges. General aspects of process parameters and resulting film properties will be addressed. Different sputtering configurations will be addressed from diode, hollow cathode to magnetrons. Course will cover both, non-reactive and reactive sputtering. It will address DC, pulse-DC, RF magnetron sputtering as well as high power impulse magnetron sputtering HIPIMS. Non-reactive and reactive sputtering will be discussed.