Patrick Morse, Arizona Thin Film Research, Tucson, AZ
Large area sputtering systems employing rotary cathodes are essential for the uniform deposition of thin films in various applications. Achieving optimal film uniformity is critical, and this study investigates the influence of the processing zone geometry on plasma production and resulting thin film uniformity in such systems. Using COMSOL Multiphysics, a comprehensive model has been developed to simulate plasma generation and transport within a large area sputtering chamber utilizing rotary cathodes. The simulations reveal a strong correlation between the processing zone geometry, including cathode spacing, target substrate distance, and chamber walls and or shields, and the uniformity of the deposited thin films. Specifically, variations in the geometry significantly alter the plasma distribution and ion flux profiles across the target, directly impacting film thickness uniformity. These findings highlight the crucial role of geometric design in optimizing large area sputtering systems for enhanced thin film uniformity. This work provides valuable insights for the design and operation of next-generation sputtering systems with rotary cathodes, emphasizing the importance of considering processing zone geometry for achieving stringent uniformity requirements.