G. V. Taylor¹, J. B. Merlo¹, L. Sohngen¹, M. Wong², S. Graiser¹, A. M. Engwall¹, S. J. Shin¹, L. B. Bayu Aji¹, S. Nakamura², S. O. Kucheyev^1
1Lawrence Livermore National Laboratory, Livermore, CA
²Blue Laser Fusion Inc., Goleta, CA
Magnetron sputter deposition enables precise control over a wide range of process parameters with exceptional repeatability. This versatility makes it a leading technique for coating applications with stringent requirements for thickness, growth modes, and stoichiometry. In this study, we explore the use of magnetron sputtering to advance boron carbide (B₄C) as a next-generation ablator material for inertial confinement fusion (ICF) and inertial fusion energy (IFE) applications. Significant progress has been made in recent years in the development of B₄C for ICF and IFE applications. These B₄C coatings must be ultrathick with a low density of nodular growth defects, possess low residual stress, and exhibit high density. However, challenges persist in controlling growth modes for coatings on oblique and non-planar substrates. Here, we present our recent developments in methods and techniques for synthesizing amorphous B₄C coatings with properties approaching those required for ICF and IFE applications. Additionally, we highlight ongoing challenges and share lessons learned, offering valuable insights to guide future advancements in coating technologies for non-planar surfaces.