Klaus Boebel1, Julien Keraudy1, Konrad Fadenberger2, Denis Kurapov1, Jörg Vetter3
1Oerlikon Surface Solutions, Balzers, Liechtenstein
2Oerlikon Balzers Coating Germany GmbH, Bergisch Gladbach, Germany
3J.Vetter-S3-Consulting, Bergisch Gladbach, Germany
PVD technologies are widely used for protective coatings on tools, components, and decorative applications. Common technologies include DC-magnetron sputtering and arc evaporation. Each has its benefits and drawbacks. Vacuum arc evaporation generates highly energized and ionized particles but results in relatively rough surfaces, while magnetron sputtering has limitations in generating ionized and energetic species of the sputtered target material.
About 15 years ago, the idea emerged to combine the advantages of arc technology with magnetron sputtering through High-power impulse magnetron sputtering (HIPIMS). This method is based on magnetron sputter deposition and involves applying extremely high power densities in short pulses to create a high-density plasma. This plasma results in a high degree of ionization of the sputtered material, leading to dense and smooth coatings.
HIPIMS is particularly useful for applications requiring high-quality thin films with excellent adhesion and uniformity, even on complex-shaped substrates.
The presentation will provide an overview of the industrial potential and perspective of HIPIMS, including its historical context and fundamental characteristics. It covers basic features and describes state-of-the-art configurations of PVD systems, highlighting applications in mass production.