Wojciech Gajewski¹, Mateusz Wiosna¹, Mohammad Afaque Hossain², Michalina Perron¹, Emil Grochala¹, Jakub Studniarek¹, Yilei Shen^2
1TRUMPF Hüttinger, Zielonka, Poland
²TRUMPF Hüttinger GmbH + Co. KG, Freiburg im Breisgau, Germany
The application of the Bipolar Pulsing technique for magnetron sputtering application is broadly used in areas such as architectural glass coating, decorative coating or photovoltaics. One of the challenges is providing a stable long-term operational parameter in a dual magnetron arrangement with the use of two different materials for the cathode. This study introduces a novel Bidirectional Pulsing method for Bipolar and Bipolar HV power supplies, enabling flexibility and high efficiency of the process called.
This is achieved by adjusting the process parameters (frequency, current, voltage, duty cycle) separately for each cathode, for example by determining the number of pulses on them. It allows to achieve desirable and homogenous composition of different deposited material. Applying distinct process parameters to each cathode offers greater control and precision during operation, for example if a co-sputtering process is applied.
The major advantage of this approach, namely its full compatibility with existing hardware, will be discussed. The implementation does not require any modification to the magnetron or coater design, making it a cost-effective and accessible solution for various applications.
In summary, the proposed method simplifies and improves the performance of existing processes while opening new opportunities for advanced applications. Its versatility, adaptability, and ease of implementation make it a highly promising solution for modern industries that require sophisticated electrode control systems.