Kazushi Sasakura1, Michie Imanishi2 1HORIBA STEC, Co., Ltd., Kyoto-City, Kyoto, Japan
2HORIBA Instruments inc., Sunnyvale, CA
A new Quadrupole Mass Spectroscopy (QMS) platform has been successfully developed with two new key features. 1. The operating pressure is significantly expanded up to 10 Pa to be more suitable for “real-time process monitoring” without the need for a differential pumping system, which is typically used to handle the QMS operating pressure limitation. 2. Sensor filament lifetime has been greatly extended, enabled by new mechanical design features increasing lifetimes more than 40X compared with the existing platform even when operating under corrosive conditions and environments.
In this presentation, we will introduce HORIBA QMS technology which has been developed over 15 years, showcase our target application example for the coating industry i.e. residual gas analysis for chamber condition monitoring / in-situ etching process monitoring. We will then give an overview of our new QMS platform which is enabled by advanced manufacturing technology, design of RF circuit and an innovative correction algorithm. We will conclude the presentation by discussing future target applications and how the new QMS platform can enhance process efficiency and device quality.