Mohamed Saleem¹, Shaun Pewsey^2
1ITW, Fremont, CA
²Brooks Instrument, Hatfield, PA
Advanced semiconductor device architectures are driving atomic scale processes and the requirements for highly accurate, stable, and repeatable gas chemistry control are greater than ever. The next-generation pressure-based MFC architecture developed by Brooks Instrument, leverages a true differential pressure sensor integrated with an absolute pressure sensor and upstream laminar flow element. This innovative design eliminates the need for precisely matched absolute sensors and enables precise flow measurement and control across the widest range of gases and process conditions.
We’ll explore the underlying design approach for differential pressure-based flow measurement and highlight how this new MFC architecture improves performance across a broader range of process conditions and applications. Data from rigorous validation—including flow accuracy, repeatability, inlet and downstream pressure insensitivity, and performance on critical low vapor pressure gases—will be shared to demonstrate real-world benefits.
Attendees will gain insight into how this innovation expands the use of pressure-based MFCs beyond traditional etch into high-pressure processes like CVD, ultimately improving process control, and device yield.