Martynas Audronis, Nova Fabrica Ltd., Ignalina, Lithuania
Optical Emission Spectroscopy (OES) is an effective real-time technique for non-intrusive characterisation, diagnostics, monitoring, and control of plasma-based processes.
Our vision is to lead the way in the future of vacuum, plasma, and surface engineering. With our expertise in Optical Spectroscopy and Technological Plasmas, we aim to have an Inteleg® system in every high-vacuum and plasma process chamber, setting the standard in advanced vacuum, plasma, and surface engineering.
Our mission is to create solutions that integrate the physical and digital realms, delivering:
• Intelligent automation and optimisation
• Maximization of throughput and yield
• Energy efficiency
• Enhanced product quality
• Environmental sustainability
The Inteleg® OES technology is central to six critical solutions in the industry:
1. Broadband plasma emission monitoring (2B-PEM®)
2. Self-plasma Optical Emission Spectroscopy for Residual Gas Analysis (RGA) and Process Gas Analysis (PGA)
3. Zero-helium leak detection in high-vacuum systems
4. EIES deposition rate monitoring and control
5. Advanced plasma diagnostics (including EEDF, Te, Ne, Ni)
6. Enabling digital transformation
This presentation provides an overview of Nova Fabrica's state-of-the-art OES-based products and solutions.