Wayne Sainty, Telemark, Battle Ground, WA
Telemark ion beam sources have been designed to provide superior performance across large and small substrates. Telemark technology offers low pressure operation (10-5 mbar) for a longer mean free path and higher ion energies than traditional End Hall sources. The source design is extremely low maintenance with no consumable components except for filaments. The Telemark ion beam source line is capable of either mixed gas or pure oxygen operation, allowing for deposition of metal oxide films of the highest index and lowest stress. Pulsed Mode for ion assisted fluorides provides fully compacted, damage free results not achievable with any other ion source. Telemark sources achieve stable films with no substrate pre-heating and are an excellent choice for depositing durable films on low temperature substrates.